On September 17, 2004 a new cleanroom facility for the production of optical microstructures was officially inaugurated.
Spin-Coater
Laboratory workplaces
With the investment of almost 3 million € (~3.6 million $) the capacity and the product portfolio in this field were clearly expanded.
Leading edge technology and highly skilled personnel guarantee the satisfaction of increased customer requirements concerning quality,
flexibility and quantity.
Wafer Stepper GCA 8000
Spray-Puddle-Developer
All processes - from spin coating of the substrates, exposure of the structures in wafer stepper exposure system, developing, ultra-sonic cleaning to sputtering and quality assurance - are carried out in a cleanroom environment.
Ultrasonic cleaning system
CS-400S Sputter system
The new CS-400SS sputter system provides high flexibility for different coatings, including broadband AR-coatings and HRC and LRC coatings.
New photolithography
