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 Photolithography
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Exposure of standard glass substrates, ceramic substrates, special substrates, overlapping
of several structure layers
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Parameters
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Projection copy
- exposure of standard glass substrates:
4"x4" to 9"x9", thickness: 1 to 3mm
- exposure of ceramic sustrates
- exposure of custom substrate dimensions and materials
- image scale:
1:5 and 1:1
- resolution capacity / image field size:
| resolution capacity (µm) |
1,4 |
1,2 |
1,0 |
3,0 |
| image field size (mm2) |
20x20 |
16x16 |
12x12 |
ø 80 |
- production of reticles in the above dimensions
using the lift-off process or wet etched
- coatings:
chromium (chrome coatings using Diadur 1/2/3/4, High Reflective Chrome, Low Reflective Chrome), silver,
aluminium
- equipment:
GCA 8000 - Wafer Stepper Exposure Systems,
AÜR 2 - automatic cover repeater
(modified -
Jenoptik GmbH)
Contact copy
- exposure of custom substrate dimensions and materials
- dimensions up to 200 x 200 mm
- resolution:
approx. 3µm
- equipment:
Suess Maskaligner
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