Microstructures: Plasma etching vs. HF etching for illuminated reticles

Properties

• By using plasma etching minimal pattern sizes of down to 2µm can be achieved.
• These structures can be filled with white color and illuminated with LED to achieve an luminous pattern.
• The same contrast values can be achieved as with much bigger HF etched structures. (contrast ratio > 0.6)
• Product fact sheet plasma etched illuminated structures

Plasma etching

HF etching